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Hybrid silicon laser
A hybrid silicon laser is a semiconductor laser fabricated from both silicon and group III-V semiconductor materials. The hybrid silicon laser was developed to address the lack of a silicon laser to enable fabrication of low-cost, mass-producible silicon optical devices. The hybrid approach takes advantage of the light-emitting properties of III-V semiconductor materials combined with the process maturity of silicon to fabricate electrically driven lasers on a silicon wafer that can be integrated with other silicon photonic devices.
== Physics ==
A hybrid silicon laser is an optical source that is fabricated from both silicon and group III-V semiconductor materials (e.g. Indium(III) phosphide, Gallium(III) arsenide). It comprises a silicon waveguide fused to an active, light-emitting, III-V epitaxial semiconductor wafer. The III-V epitaxial wafer is designed with different layers such that the active layer can emit light when it is excited either by shining light, e.g. a laser onto it; or by passing electricity through it. The emitted light from the active layer couples into the silicon waveguide due to their close proximity (<130 nm separation) where it can be guided to reflect off mirrors at the end of the silicon waveguide to form the laser cavity.
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